The SEC‑Z700X Series is equipped with reliable thermal sensors and a pressure‑insensitive function for stable flow rate control. Its on‑board pressure measurement reduces the cost, size, and complexity of gas delivery systems.

 Ensures precise stabilization in dynamic flow conditions

Rapid response 

 Multi‑Gas Flexibility 

Maintains stable flow despite fluctuations

Pressure‑Insensitive Control 

Reduces system footprint, cost & complexity

Compact Integration 

SEC-Z700X Series

Stable precursor flow for epitaxial growth in multi‑reactor setups

CVD Chamber Gas Delivery

Maintains consistent etchant gas flow under pressure variations

Dry Etch Process Control

Simplifies gas distribution in cluster tool without extra regulators

MOCVD Tool Gas Lines

Reduces footprint and complexity in multi‑chamber gas delivery

Semiconductor Cluster Tool Integration

Adapts to multiple gases and flow ranges for experimentation

Process Development in R&D Labs

Ensures precise gas flow for photoresist uniformity

Photolithography Chemical Metering

Pressure Insensitive Mass Flow Controller

Semiconductors and Materials do not exist as distinct markets, but are interconnected, forming a value chain similar to that of textiles. The beginning of this process is Wafer. Each process, like Deposition, Lithography, Etching, and CMP, has a very large value chain. Moreover, the process is supported by huge facilities.
This interconnected system is the fabric of the value chain, or “Woven Value." HORIBA's competencies in Control, Measurement and Analysis are enabling researchers, developers, original equipment manufacturers, and end users to deliver novels solutions for the entire of this value chains.

Semiconductor

The S600 Series is designed by HORIBA STEC and manufactured by HORIBA Precision Instruments to emphasize its cost reduction capabilities in your process. The S600 Series is suitable for a large variety of industries and applications. The S600 Series can control a wide range of flows: from 3 SCCM to 500 SLM and has various types of communications available i.e. Analog, RS485, DeviceNet™, PROFIBUS™, and EtherCAT®. The S600 Series offers high accuracy (+/- 1.0% S.P. *1) and high-speed response.

MFC - S600 Series

S-600 Series (Configurable: S-610, S-620, etc.)

Model

O₂, CO, CO₂, NOx, SO₂, CH₄, H₂S (Selectable per model)

Measurement Items

UV: 253.7 nm, VIS: 546.1 nm (Hg lamp standard)

Measurement Wavelength

NDIR (CO/CO₂), Zirconia (O₂), Chemiluminescence (NOx), Electrochemical (H₂S)

Measurement Principle

0–100% (O₂), 0–5000 ppm (NOx), 0–100 ppm (SO₂), 0–25% (CO₂)

Measurement Range

Accuracy

Repeatability

Response Time (T90)

Sample Flow Rate

Analog (4–20 mA, 0–10 V), Digital (RS-485, Ethernet, Modbus)

Output Signals

Power Supply

Operating Temperature

19" rack-mountable (3U/4U), IP rating: IP42

Enclosure

CE, ISO 9001, EPA-compliant (for emissions models)

Certifications

The IR‑300 Vapor Concentration Monitor provides real‑time inline measurement of precursor concentration in Metal‑Organic Chemical Vapor Deposition (MOCVD) processes, enabling precise control of LED, optical device, and semiconductor component fabrication. Its fast response and excellent repeatability help optimize process parameters, improve yield, ensure reproducibility, extend MTTA, and reduce unplanned interventions and material waste.

IR-300

The IR‑400 is a high‑grade gas monitor designed for real‑time chamber cleaning end‑point monitoring during deposition processes. By optimizing cleaning cycles, it reduces cleaning time and gas consumption, minimizes chamber damage, and extends component lifetimes.

IR-400

The LEM Series is a real-time interferometric process monitor offering high-precision film thickness and trench depth measurement during etch and deposition processes. Featuring selectable 670, 905, or&nbsp;980 nm lasers and a compact CCD camera, it mounts atop any dry etch/deposition chamber for fringe-based endpoint detection, rate monitoring, and interface identification, enabling enhanced control and reproducibility in multi-layer fabrication.

LEM Series

The SEC-N100 Series is a digital mass flow controller offering wide flow control from 10 SCCM to 1000 SLM, multiple communication options (digital/analog, DeviceNet™, CC‑Link®, PROFIBUS™, EtherCAT™), high setpoint accuracy (± 1.0% S.P.) and high-speed response, with multi-gas/multi-range functionality for cost reduction across diverse industries.

SEC-N100 Series

This general purpose mass flow controller has a reliable thermal sensor and solenoid valve, allowing you to achieve high-level control of gas flow. A versatile component, the mass flow controller SEC-E series can be used in a wide range of industries. Gas flow through the mass flow controller can be controlled over a range of flows: from 10 SCCM to 200 SLM.

SEC-E series

The SEC-Z500X Series is HORIBA’s bestselling digital mass flow controller, designed for fast, flexible, and precise gas flow control in semiconductor processes and beyond. Featuring multi-range and multi-gas functionality, 1 % accuracy, rapid response, and all-metal construction, it minimizes the need for spare units while offering seamless on-site reconfiguration and versatile digital/analog connectivity.

SEC-Z500X Series

The SEC‑8000 F/D/E series is a high-temperature digital mass flow controller engineered for demanding environments. With the ability to operate from 15 °C to 120 °C, this all-digital MFC delivers ±1.0 % set-point accuracy, ultra-clean design, and rapid response—making it ideal for semiconductor and compound semiconductor processing.

SEC-8000 F/D/E Series

High-Temperature Digital Mass Flow Controller

The D700uF is a precision micro-flow mass flow module designed for controlling extremely low gas flows up to 5 SCCM. Engineered for high-aspect-ratio semiconductor processes, it offers exceptional accuracy, rapid response, and robust reliability under variable pressure conditions.

D700uF

Micro Flow Pressure-Insensitive Mass Flow Module

The EV 2.0 Series is a versatile, high-performance optical endpoint and chamber health monitor designed for semiconductor dry-etch, CVD, and cleaning processes. Utilizing configurable Optical Emission Spectroscopy (OES) and/or Multi-Wavelength Interferometry (INT), it delivers real-time in-situ process endpoint detection, chamber condition monitoring, and recipe-driven quality control within single or cluster tool environments.

SEC-Z700X Series

SEC-Z700X Series

Why Choose SEC-Z700X Series

Key Advantages of SEC-Z700X Series

Rapid response

Multi‑Gas Flexibility

Pressure‑Insensitive Control

Compact Integration

Applications of SEC-Z700X Series

CVD Chamber Gas Delivery

Dry Etch Process Control

MOCVD Tool Gas Lines

Semiconductor Cluster Tool Integration

Process Development in R&D Labs

Photolithography Chemical Metering

Related Products

MFC - S600 Series

IR-300

IR-400

LEM Series

SEC-N100 Series

SEC-Z700X Series

NOT SURE WHAT YOU ARE LOOKING FOR?

SEC-Z700X Series

SEC-Z700X Series

Why Choose SEC-Z700X Series

Key Advantages of SEC-Z700X Series

Rapid response

Multi‑Gas Flexibility

Pressure‑Insensitive Control

Compact Integration

Applications of SEC-Z700X Series

CVD Chamber Gas Delivery

Dry Etch Process Control

MOCVD Tool Gas Lines

Semiconductor Cluster Tool Integration

Process Development in R&D Labs

Photolithography Chemical Metering

Related Products

MFC - S600 Series

IR-300

IR-400

LEM Series

SEC-N100 Series

SEC-Z700X Series

NOT SURE WHAT YOU ARE LOOKING FOR?

Rapid response 

Multi‑Gas Flexibility 

Pressure‑Insensitive Control 

Compact Integration 

Process Development in R&D Labs