Precision measurement of perovskite and CIGS layer thickness/composition during PV manufacturing

Solar Cell Thin-Film Optimization

Real-time monitoring of ITO/AZO conductive coatings for heterojunction solar cells

TCO Layer Quality Assurance

In-situ thickness verification of anti-reflection and barrier coatings during deposition

Vacuum Deposition Process Control

Stress and adhesion characterization for DLC and TiN tribological coatings

Hard Coating Performance Validation

Non-destructive defect mapping in synthetic diamond wafers for electronic applications

CVD Diamond Quality Inspection

NV center density analysis for diamond-based quantum sensors and computing

Quantum Diamond Characterization

Multi-point thickness mapping of dielectric stacks for precision optics

Optical Coating Uniformity Check

Identification of delamination and moisture ingress in encapsulated solar panels

PV Module Degradation Analysis

The S600 Series is designed by HORIBA STEC and manufactured by HORIBA Precision Instruments to emphasize its cost reduction capabilities in your process. The S600 Series is suitable for a large variety of industries and applications. The S600 Series can control a wide range of flows: from 3 SCCM to 500 SLM and has various types of communications available i.e. Analog, RS485, DeviceNet™, PROFIBUS™, and EtherCAT®. The S600 Series offers high accuracy (+/- 1.0% S.P. *1) and high-speed response.

Discover what makes the HORIBA S-600 Series the gold standard for precision gas analysis in industrial and environmental applications.

Accommodates micro to large‑scale flows

Wide Flow Range

Multi‑Protocol Connectivity

High Precision 

 Minimizes process lag and enhances dynamic control

Rapid Response

Key Advanatages

MFC - S600 Series

 Precise gas flow for solar cell deposition

Photovoltaic Manufacturing

Vacuum Coating

Controlled gas delivery in diamond synthesis

Diamond MPCVD

Flexible flow control for experimental setups

Research Laboratories 

S-600 Series (Configurable: S-610, S-620, etc.)

Model

O₂, CO, CO₂, NOx, SO₂, CH₄, H₂S (Selectable per model)

Measurement Items

UV: 253.7 nm, VIS: 546.1 nm (Hg lamp standard)

Measurement Wavelength

NDIR (CO/CO₂), Zirconia (O₂), Chemiluminescence (NOx), Electrochemical (H₂S)

Measurement Principle

0–100% (O₂), 0–5000 ppm (NOx), 0–100 ppm (SO₂), 0–25% (CO₂)

Measurement Range

Accuracy

Repeatability

Response Time (T90)

Sample Flow Rate

Analog (4–20 mA, 0–10 V), Digital (RS-485, Ethernet, Modbus)

Output Signals

Power Supply

Operating Temperature

19" rack-mountable (3U/4U), IP rating: IP42

Enclosure

CE, ISO 9001, EPA-compliant (for emissions models)

Certifications

Industry-leading features for precision gas analysis

High S.P. accuracy:  +/- 1.0% S.P. (*1)

Wide variety of communications and power supply (Analog 0-5V/RS485/PROFIBUS/DeviceNet/EtherCAT)

HORIBA India has local factory for assmbly and service.
Excluding S600-DR Series

Why Choose S-600

Semiconductors and Materials do not exist as distinct markets, but are interconnected, forming a value chain similar to that of textiles. The beginning of this process is Wafer. Each process, like Deposition, Lithography, Etching, and CMP, has a very large value chain. Moreover, the process is supported by huge facilities.
This interconnected system is the fabric of the value chain, or “Woven Value." HORIBA's competencies in Control, Measurement and Analysis are enabling researchers, developers, original equipment manufacturers, and end users to deliver novels solutions for the entire of this value chains.

Semiconductor

The IR‑300 Vapor Concentration Monitor provides real‑time inline measurement of precursor concentration in Metal‑Organic Chemical Vapor Deposition (MOCVD) processes, enabling precise control of LED, optical device, and semiconductor component fabrication. Its fast response and excellent repeatability help optimize process parameters, improve yield, ensure reproducibility, extend MTTA, and reduce unplanned interventions and material waste.

IR-300

The IR‑400 is a high‑grade gas monitor designed for real‑time chamber cleaning end‑point monitoring during deposition processes. By optimizing cleaning cycles, it reduces cleaning time and gas consumption, minimizes chamber damage, and extends component lifetimes.

IR-400

The LEM Series is a real-time interferometric process monitor offering high-precision film thickness and trench depth measurement during etch and deposition processes. Featuring selectable 670, 905, or&nbsp;980 nm lasers and a compact CCD camera, it mounts atop any dry etch/deposition chamber for fringe-based endpoint detection, rate monitoring, and interface identification, enabling enhanced control and reproducibility in multi-layer fabrication.

LEM Series

The SEC-N100 Series is a digital mass flow controller offering wide flow control from 10 SCCM to 1000 SLM, multiple communication options (digital/analog, DeviceNet™, CC‑Link®, PROFIBUS™, EtherCAT™), high setpoint accuracy (± 1.0% S.P.) and high-speed response, with multi-gas/multi-range functionality for cost reduction across diverse industries.

SEC-N100 Series

The SEC‑Z700X Series is equipped with reliable thermal sensors and a pressure‑insensitive function for stable flow rate control. Its on‑board pressure measurement reduces the cost, size, and complexity of gas delivery systems.

SEC-Z700X Series

Pressure Insensitive Mass Flow Controller

This general purpose mass flow controller has a reliable thermal sensor and solenoid valve, allowing you to achieve high-level control of gas flow. A versatile component, the mass flow controller SEC-E series can be used in a wide range of industries. Gas flow through the mass flow controller can be controlled over a range of flows: from 10 SCCM to 200 SLM.

SEC-E series

The SEC-Z500X Series is HORIBA’s bestselling digital mass flow controller, designed for fast, flexible, and precise gas flow control in semiconductor processes and beyond. Featuring multi-range and multi-gas functionality, 1 % accuracy, rapid response, and all-metal construction, it minimizes the need for spare units while offering seamless on-site reconfiguration and versatile digital/analog connectivity.

SEC-Z500X Series

The SEC‑8000 F/D/E series is a high-temperature digital mass flow controller engineered for demanding environments. With the ability to operate from 15 °C to 120 °C, this all-digital MFC delivers ±1.0 % set-point accuracy, ultra-clean design, and rapid response—making it ideal for semiconductor and compound semiconductor processing.

SEC-8000 F/D/E Series

High-Temperature Digital Mass Flow Controller

The D700uF is a precision micro-flow mass flow module designed for controlling extremely low gas flows up to 5 SCCM. Engineered for high-aspect-ratio semiconductor processes, it offers exceptional accuracy, rapid response, and robust reliability under variable pressure conditions.

D700uF

Micro Flow Pressure-Insensitive Mass Flow Module

The EV 2.0 Series is a versatile, high-performance optical endpoint and chamber health monitor designed for semiconductor dry-etch, CVD, and cleaning processes. Utilizing configurable Optical Emission Spectroscopy (OES) and/or Multi-Wavelength Interferometry (INT), it delivers real-time in-situ process endpoint detection, chamber condition monitoring, and recipe-driven quality control within single or cluster tool environments.

Models	Select communication mode	Select power supply
S600-2*2 series	Digital communication ▶RS485 F-NET Protocol Analog communication ▶0~5VDC	±15V(±5%) or 24VDC HORIBA’s lineup includes power supply MT-51D series
S600-226 series	PROFIBUSTM communication Analog communication ▶0~5VDC	Confirming to PROFIBUSTM standards HORIBA’s lineup includes power supply MT-51D series
S600-624 series	DeviceNetTM communication	Confirming to ODVA standards
S600-624 series	EtherCAT® communication	Confirming to EtherCAT® standards 24VDC

MFC - S600 Series

MFC - S600 Series

Why Choose MFC - S600 Series

Key Advantages of MFC - S600 Series

Wide Flow Range

Multi‑Protocol Connectivity

High Precision

Rapid Response

Applications of MFC - S600 Series

Photovoltaic Manufacturing

Vacuum Coating

Diamond MPCVD

Research Laboratories

Technical Specifications of MFC - S600 Series

Related Products

MFC - S600 Series

IR-300

IR-400

LEM Series

SEC-N100 Series

SEC-Z700X Series

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