IR-400
Gas Monitor for Chamber Cleaning
The IR‑400 is a high‑grade gas monitor designed for real‑time chamber cleaning end‑point monitoring during deposition processes. By optimizing cleaning cycles, it reduces cleaning time and gas consumption, minimizes chamber damage, and extends component lifetimes.
Why Choose IR-400
- Real‑time chamber cleaning end‑point detection for optimized cleaning cycles
- Multi‑gas monitoring supports SiF₄ and CF₄ for versatile applications
- Heated gas cell up to 180 °C ensures accurate measurements at elevated temperatures
- High sensitivity NDIR detection for stable, low‑level gas measurements
- Dual analog and digital communication for seamless integration
- Multi‑display interface for enhanced usability and real‑time status overview
Key Advantages of IR-400
Accelerated Cleaning
Real‑time End‑Point Detection
Minimizes over‑cleaning and speeds up chamber readiness
Reduced Gas Consumption
Optimized gas usage — Lowers
Lowers operating costs and environmental impact
Enhanced Process Consistency
Repeatable end‑point monitoring
Ensures predictable, uniform cleaning results;
Extended Component
Minimizes chamber damage
Prolongs maintenance intervals and reduces downtime
Applications of IR-400
Chamber cleaning end‑point monitoring in semiconductor deposition tools
Real‑time optimization of MOCVD process cleaning cycles
Process control for CF₄ and SiF₄ gas usage in dry etch systems
Exhaust line analysis for predictive maintenance in fab equipment
Vacuum chamber health monitoring to prevent equipment damage
Facility exhaust monitoring for process safety and compliance
Technical Specifications of IR-400
External Dimension
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