IR-300

Vapor Concentration Monitor

Liquid and solid materials are used in MOCVD (Metal Organic Chemical Vapor Deposition) equipment, which is widely employed in compound semiconductor manufacturing processes, and are generally supplied to the chamber as vaporized gas by bubbling method. Real-time gas concentration monitoring is important to realize a stable deposition process. The system  can also monitor the concentration of IPA vapor in the drying process and B2H6 gas, which decomposes easily. In addition to monitoring vapor concentration, the system can  be applied to concentration control systems including feedback control.

IR-300

Why Choose IR-300

  • Real-time Monitoring
  • Multi-calibration Curve Function (Optional) 
  • Multi-display Function 
  • Simple, Compact Design 
  • Non-dispersive Infrared Absorptiometry (NDIR) based technology
Why Choose

Key Advantages of IR-300

1.

Real-time Monitoring

Fast response and excellent repeatability

It allows real time tracking of changes in vapor concentration

2.

Multi-calibration Curve Function (Optional)

Up to 3 chemicals or ranges

Can monitor various chemicals by one unit.

3.

Multi-display Function

User onsite checking capability.

The multi-display on the top of the IR-300 gives more information.

4.

Simple, Compact Design

With a face-to-face size of 124 mm

the unit’s compact and mount-orientation-free design allows for easy integration

Applications of IR-300

Monitor residual quantities of precursor

Know when a bubbler will require exchanging

Process parameter optimization

Multichemical calibration for novel precursor development.

Continuous concentration monitoring of precursor

Optimize process control to produce more high-grade devices

Get alert during the process.

To reduce scrap and improve yield

Precursor optimization

Reduce valuable precursor waste

Technical Specifications of IR-300


*1 Please contact HORIBA STEC regarding chemical and/or full-scale concentration other than those shown above.

*2 The specification is guaranteed under the standard conditions of HORIBA STEC.

      Ambient temperature: 23±2°C, Gas cell temperature: 60°C, Measurement flow rate: 1000 SCCM, Calibration gas: C3H8 balanced in N2 at 105 kPa(A)

*3 Accuracy is based on concentration of the calibration gas.

*4 Gas replacement time (Td: time delay) is not included in the response.

     The typical Td in our inspection equipment is approx. 1.0 second.

     The response without moving average is approx. 1.5 second. It is necessary to change # of moving average of firmware settings by digital communication.

*5 Recommended operating condition. The performance is guaranteed on the standard condition.

*6 Required specification of temperature controller:

     Control cycle: 1 second or less, PID control with auto tuning function

*7 Optional wetted material: Body: SUS 316L, Gas cell optical window: Sapphire, Ni, Al

*8 The height of IR-315 is 145mm

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