ISO Class 1 in Open Space
Create an ultra-clean zone without walls or ceiling while keeping full access to people, tools and instruments.
Create ISO Class 1 Clean Zones Without Building a Full Cleanroom
KOACH is HORIBA’s open-system instant cleanroom solution that creates localized ultra-clean zones at the point of use. Ideal for semiconductor, electronics, R&D, microscopy, and precision assembly applications.
Clean Zone in Minutes
Up to ISO Class 1
Open & Accessible Workspace
Modular & Relocatable
Semiconductor
Electronics
R&D Labs
Microscopy
Precision Assembly
Why Choose KOACH ISO Class 1 Solutions
Rapid Start-Up
Reach ISO Class 1 air cleanliness typically within 105–110 seconds from power-on.
Modular & Mobile
Configurations can be relocated, expanded, or re-arranged as requirements evolve.
Energy & Cost Efficient
Achieve localized cleanliness with less infrastructure than conventional cleanroom construction.
KOACH Product Range
Select the suitable KOACH configuration based on your workspace, process and clean zone requirement.
Table KOACH T500-F
- Compact clean zone for benches
- Lightweight and easy to move
- Ideal for labs and R&D
Stand KOACH C900-F
- Large open clean zone
- Suitable for assembly and inspection
- Multi-side accessibility
Floor KOACH
- Scalable floor-level clean zone
- Suitable for larger work areas
- Flexible process integration
Evaluating Clean Room Manufacturers?
What KOACH Is — Standalone ISO Class 1
clean zone solution.
Best For — Semiconductor, electronics,
R&D, microscopy and precision assembly.
Key Benefit — Faster, more flexible
alternative to full-room construction.
Traditional Cleanroom vs KOACH
Traditional
KOACH
Full-room construction
→
Localized clean zone
Longer build time
→
Rapid deployment
Fixed layout
→
Modular & relocatable
Higher infrastructure cost
→
Lower setup burden
Ideal for High-End Contamination-Control Applications
KOACH helps create ISO Class 1 clean zones exactly where contamination control matters most.
Semiconductor & Electronics
KOACH creates a localized ISO Class 1 clean zone for particle-sensitive semiconductor and electronics workflows. It is suitable for wafer handling, microelectronics inspection, component preparation, and clean assembly where full-room cleanroom construction may not be required.
Precision Assembly
KOACH helps protect critical assembly zones from airborne contamination while keeping the workspace open and accessible. It is useful for assembling optical parts, sensors, miniature components, and other high-value precision products.
R&D Labs
In R&D environments, KOACH provides a flexible clean zone for experiments, prototypes, and sample preparation. Its modular setup is suitable for laboratories where workflows change frequently and a permanent cleanroom may not be practical.
Microscopy Workstations
KOACH supports microscopy and imaging workflows by reducing particle exposure around samples and instruments. The open clean-zone design allows operators to access microscopes, tools, and samples without the restrictions of a closed enclosure.
Analytical Applications
KOACH helps maintain cleaner handling conditions for sensitive analytical workflows, sample preparation, and instrument-adjacent processes. It supports better contamination control where sample integrity and repeatability are important.
Particle-Sensitive Handling
KOACH is suited for workflows where components, samples, or materials need localized protection from airborne particles. It creates a clean working area at the point of use without enclosing the complete room.
Need the Right Clean Zone for Your Process?
Share your application, workspace, and cleanliness requirement. Our team will help recommend the most suitable KOACH solution for your site.
Ideal for semiconductor, electronics, R&D, and precision
applications.
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Frequently Asked Questions
KOACH generates opposing laminar airflow, blocking external particle intrusion and forcing contaminants out of the clean zone.
Typically within 105–110 seconds from system startup.
Yes, KOACH requires no structural modification or closed room setup.
Any application/process requiring local ultra-clean conditions with unrestricted access and full visibility.