GD-Profiler 2™
Pulsed-RF Glow Discharge Spectrometer
The GD-Profiler 2™ provides fast, simultaneous analysis of all elements of interest including the gases nitrogen, oxygen, hydrogen and chlorine. It is an ideal tool for thin and thick films characterization and process studies.
Equipped with an RF source that can operate in pulsed mode for fragile samples, the range of applications of the GD-Profiler 2™ goes from corrosion studies to PVD coating process control, from thin film PV development to LED Quality Control and it is used in Universities as well as in Industrial Research laboratories.
Why Choose GD-Profiler 2™
- Pulsed-RF source optimized for stability and crater shape
- Simultaneous optics 110–800 nm for H, O, C, N, Cl analysis
- Patented HDD detectors for speed and sensitivity
- Built-in DiP interferometer for online crater depth & erosion rate
- Ion-etched holographic gratings for maximum throughput & resolution
- QUANTUM™ software with Tabular report tool for powerful analysis
- Upto 48 elements can be detected from ppm to percentage.
Key Advantages of GD-Profiler 2™
Nanometer Depth Resolution
Profiles films from nm to hundreds of microns.
Wide Spectral Coverage
Deep UV to analyze H, O, C, N, Cl.
Enhanced Sensitivity
High‑speed detection without compromise.
Real‑Time Depth Monitoring
Accurate crater depth and erosion rate measurement.
Applications of GD-Profiler 2™
Photovoltaic thin-film characterization
Depth profiling for PV layer development
Corrosion layer analysis
Elemental profiling of protective coatings
LED manufacturing QC
Thin film uniformity and composition control
PVD/CVD process optimization
Film thickness and composition monitoring
Technical Specifications of GD-Profiler 2™
| Category | Details |
|---|---|
| Typical Application Domains | PV, Metallurgy, LED Manufacturing, Corrosion Studies, Organic & Micro-electronics, R&D, Deposition Process Optimization, PVD, CVD, Automotive, Li Batteries |
| Vacuum Requirement | No UHV required |
| Element Detection | Measures H, D, O, Li, Na, C, N, etc. with patented High Dynamic Detectors |
| Spectral Flexibility | Optional monochromator with Image Mode and High Dynamic Detection for full spectrum recording |
| Source Technology | Pulsed RF Source for RF and pulsed RF modes with auto-matching |
| Sample Preparation | Differential double pumping of the source (patented) for SEM sample preparation |
| Surface Cleaning | Built-in Plasma Cleaning function |
| Sputtering Technology | Patented UFS (Ultra-Fast Sputtering) for polymers and organics |
| Depth Measurement | Patented DIP – Built-in interferometer for real-time depth measurement |
| Sample Flexibility | Various anode diameters and accessories for irregularly shaped samples |
| Software | Windows 10-based software; multiple licenses for remote installations |
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